Makyoh topography: a simple and powerful method for the flatness characterisation of semiconductor wafers
Ferenc Riesz, István Endre Lukács, János Szabó, János P. Makai, Zsolt John Laczik, Bálint Pődör, István Réti, Béla Szentpáli, Imre Eördögh
The paper presents our research in the field of Makyoh topography, a method based on an ancient principle. The method’s application is the qualitative and quantitative study of semiconductor wafers and other mirror-like surfaces.